The industry standard for reflector shaping combined with array optimisation and other features for design and analysis of advanced antenna systems: POS is your product for advanced payload technologies.
Optimisation of shaped reflectors
Single, dual and multiple reflector systems can be shaped to achieve contoured beams. Beam shapes can be defined by the easy-to-use built-in templates in TICRA Tools or by importning station files from SATSOFT.
Direct radiating arrays
POS comes with efficient algorithms for analysis – and optimisation – of arrays and has several array models that allow the user to quickly define simple or complex arrays. Both dense and sparse arrays are supported, and the elements may be identical or unique. It is also possible to use array elements modelled in CHAMP 3D or ESTEAM in the array – and perform simultaneous optimisation of the elements and excitation coefficients.
Optimisation of array-fed reflectors
Array-fed reflectors can be optimised in terms of reflector shape, array geometry, and excitation coefficients. The combination of efficient algorithms for reflector analysis and array optimisation makes it feasible to optimise very complex antenna systems fast and efficiently.
Excitation coefficients can also be optimised for several reflector shapes simultaneously to get the best performance under multiple thermal conditions.
Manufacturing-imposed constraints for surface curvature and constraints imposed by the payload envelope on surface displacement can be included in the optimisation. The same is true for constraints on feed positions and constraints on the dynamic range in beam-forming networks.
POS integrated in TICRA Tools
POS is integrated in TICRA Tools. This makes it easy for the user to combine the different products of TICRA in their daily work. It is, for example, possible to use horns modelled in CHAMP 3D as elements in arrays or as feeds for shaped reflectors – or perform scattering analysis with the optimised antenna designs in ESTEAM.
Jakob Rosenkrantz de Lasson
- Determination of Manufacturing Tolerances using Uncertainty Quantification for the Realization of a Dual Circularly Polarized Elliptical Feed Horn
- Determination of Manufacturing Tolerances of a Feed Horn using Uncertainty Quantification
- Large Reflectarray for SAR for Earth Observation: RF Design and Measurement Correlation